The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Oct. 21, 2022
Applicants:

Carboncompetence Gmbh, Wattens, AT;

Yg-1 Co., Ltd., Incheon, KR;

Inventors:

Detlef Steinmuller, Aldrans, AT;

Doris Steinmuller-Nethl, Aldrans, AT;

Maximilian Steinmuller, Innsbruck, AT;

Assignees:

CARBONCOMPETENCE GMBH, Wattens, AT;

YG-1 CO., LTD., Incheon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/27 (2006.01);
U.S. Cl.
CPC ...
C23C 16/278 (2013.01); C23C 16/271 (2013.01); C23C 16/277 (2013.01);
Abstract

A device () and a process for applying a doped diamond layer to a substrate (a) by chemical vapour deposition. The device () has a deposition chamber for holding the substrate (a), a gas activation element () in the form of a hollow body with a flow channel (b) for a process gas, in particular hydrogen, an outlet opening () leading from the flow channel (b) into the deposition chamber (), a heating device () for heating a wall (a) of the gas activation element () surrounding the flow channel (b) and a solid precursor, other than carbon, within the flow channel (b).


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