Cambridge, MA, United States of America

Maximilian Hoerantner

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovator Maximilian Hoerantner: Pioneering Vapor Transport Deposition

Introduction: Maximilian Hoerantner, based in Cambridge, MA, is making significant strides in the field of vapor transport deposition technology. With his innovative solutions and a focus on multi-component perovskite thin-films, he has earned recognition within the scientific community and among industry professionals.

Latest Patents: Hoerantner holds a patent for his invention titled "Alternating Multi-Source Vapor Transport Deposition." This patent discloses advanced vapor transport deposition systems and methods that facilitate alternating sequential vapor transport deposition of multi-component perovskite thin-films. The system features multiple vaporizing sources that can be controlled either mechanically or digitally, allowing for high throughput deposition. The alternating sequential deposition method not only speeds up the process but also minimizes material degradation caused by varying vapor temperatures.

Career Highlights: Hoerantner is affiliated with the Massachusetts Institute of Technology (MIT), a leading institution in technological development and research. His work is characterized by a commitment to pushing the boundaries of material science and engineering, which has proven to be essential for the advancement of electronic materials.

Collaborations: Maximilian Hoerantner collaborates with Vladimir Bulovic, a notable figure in the field whose insights and expertise complement Hoerantner's research endeavors. Their partnership reflects a shared vision for innovation and the development of next-generation technologies.

Conclusion: In summary, Maximilian Hoerantner's contributions to the area of vapor transport deposition underscore his role as an influential inventor. With a focus on enhancing the efficiency and quality of thin-film materials, he is paving the way for future advancements in the field, demonstrating the impact of innovative thinking rooted in scientific research.

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