Company Filing History:
Years Active: 1990-1995
Title: Max Stadler: Innovator in Semiconductor Processing
Introduction
Max Stadler is a notable inventor based in Haiming, Germany. He has made significant contributions to the field of semiconductor processing, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of wet-chemical treatments for semiconductor wafers.
Latest Patents
Stadler's latest patents include a process for the wet-chemical treatment of disk-shaped workpieces. This innovative process involves exposing workpieces to a flow of a gassified treatment medium, which is generated by homogeneously dispersing gas bubbles in a liquid. Another significant patent is for a method and liquid preparation for removing residues of auxiliary sawing materials from crystalline rods. This process allows for the easy removal of residues from wafers obtained after sawing operations, particularly using aqueous carboxylic solutions, such as aqueous formic acid.
Career Highlights
Max Stadler is associated with Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the methods used in the semiconductor industry.
Collaborations
Stadler has collaborated with notable colleagues, including Gunter Schwab and Peter Romeder, contributing to various projects that enhance semiconductor processing techniques.
Conclusion
Max Stadler's innovative patents and contributions to semiconductor processing highlight his role as a key figure in the industry. His work continues to influence advancements in technology and manufacturing processes.