Mauro Riva

Title: Innovations of Mauro Riva in Photopatternable Compositions

Introduction

Mauro Riva is an accomplished inventor based in Lainate, Italy. He has made significant contributions to the field of materials science, particularly in the development of photopatternable compositions. His work is essential for advancing technologies in electronic and optoelectronic devices.

Latest Patents

Mauro Riva holds a patent for "Photopatternable compositions, patterned high k thin film dielectrics and related devices." This patent describes a photopatternable composition that includes a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The composition is designed to prepare a patterned thin film component for use in various electronic applications, such as organic thin film transistors. The resulting patterned thin film component serves as a gate dielectric with a high dielectric constant, exceeding 10.

Career Highlights

Mauro Riva is currently employed at Flexterra, Inc., where he continues to innovate in the field of materials for electronic devices. His expertise in photopatternable compositions has positioned him as a key player in the development of advanced materials for next-generation technologies.

Collaborations

Mauro has collaborated with notable colleagues, including Wei Zhao and Antonio Facchetti. Their combined efforts contribute to the advancement of research and development in the field of photopatternable materials.

Conclusion

Mauro Riva's contributions to the field of photopatternable compositions highlight his innovative spirit and dedication to advancing technology. His work at Flexterra, Inc. and his patent on high k thin film dielectrics are significant milestones in the realm of electronic and optoelectronic devices.