IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10409159 B1

PDFFull Text
Date of Patent:
Sep. 10, 2019

Filed:

Dec. 26, 2016

Photopatternable compositions, patterned high k thin film dielectrics and related devices

Applicant:

Flexterra, Inc., Skokie, IL (US);

Inventors:

Wei Zhao, Skokie, IL (US);

Antonio Facchetti, Chicago, IL (US);

Yan Zheng, Skokie, IL (US);

Andrea Stefani, Lainate, IT;

Mauro Riva, Lainate, IT;

Caterina Soldano, Lainate, IT;

Michele Muccini, Monterotondo Stazione, IT;

Assignee:

Flexterra, Inc., Skokie, IL (US);

Attorney:

McDonnell Boehnen Hulbert & Berghoff LLP

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/004 (2006.01); C08F 214/22 (2006.01); H01L 51/52 (2006.01); H01L 51/00 (2006.01); C09D 127/16 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08F 214/222 (2013.01); C09D 127/16 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0384 (2013.01); G03F 7/162 (2013.01); G03F 7/2002 (2013.01); G03F 7/32 (2013.01); G03F 7/38 (2013.01); H01L 51/004 (2013.01); H01L 51/5296 (2013.01); H01L 51/052 (2013.01); H01L 51/0541 (2013.01); H01L 51/0545 (2013.01);
Abstract

The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.

Find Patent Forward Citations

Loading…