Berlin, Germany

Matthias Rost

This inventor holds 1 USPTO granted patent and 1 published patent application, plus 1 CIPO patent and 1 EPO patent. Top assignee: Atotech Deutschland Gmbh. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Rost. Retrieved from https://idiyas.com/inventor/matthias-rost

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Matthias Rost: Innovator in Chromium Layer Deposition

Introduction

Matthias Rost is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of materials science, particularly in the area of chromium layer deposition. His innovative methods have implications for various industrial applications.

Latest Patents

Matthias Rost holds a patent for a "Method for depositing a chromium or chromium alloy layer and plating apparatus." This patent outlines a method for depositing a chromium or chromium alloy layer on at least one substrate, showcasing his expertise in advanced plating techniques. He has 1 patent to his name.

Career Highlights

Rost is currently employed at Atotech Deutschland GmbH, a leading company in the field of surface finishing and electroplating. His work at Atotech has allowed him to develop and refine his innovative methods, contributing to the company's reputation for excellence in technology.

Collaborations

Matthias has collaborated with talented coworkers, including Michael Muigg and Anke Walter. Their combined expertise fosters a creative environment that drives innovation within their projects.

Conclusion

Matthias Rost is a distinguished inventor whose work in chromium layer deposition has made a significant impact in the field. His contributions continue to influence advancements in surface finishing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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