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Years Active: 2009
Title: Matthias Lipinsky: Innovator in Semiconductor Technology
Introduction
Matthias Lipinsky is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of photolithographic processing. His innovative approaches have led to advancements that enhance the manufacturing of integrated circuit devices.
Latest Patents
Lipinsky holds a patent for "Methods of forming mask patterns on semiconductor wafers that compensate for nonuniform center-to-edge etch rates during photolithographic processing." This patent outlines methods for selectively widening portions of a mask pattern that extend adjacent to the outer edge of a semiconductor wafer. These techniques aim to achieve more uniform center-to-edge critical dimensions (CD) during the photolithographic patterning of underlying layers, such as insulating layers and antireflective coatings.
Career Highlights
Throughout his career, Matthias Lipinsky has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Co., Ltd. and IBM, where he contributed his expertise in semiconductor manufacturing processes. His work has been instrumental in improving the efficiency and effectiveness of photolithographic techniques.
Collaborations
Some of Lipinsky's notable coworkers include Chong Kwang Chang and Wan Jae Park. Their collaborative efforts have furthered advancements in semiconductor technology and have contributed to the success of various projects.
Conclusion
Matthias Lipinsky's innovative work in semiconductor technology has made a lasting impact on the industry. His patent and collaborations with leading companies highlight his role as a key figure in advancing photolithographic processing techniques.