Mainaschaff, Germany

Matthias Landmann

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Singulus Technologies Ag. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Landmann. Retrieved from https://idiyas.com/inventor/matthias-landmann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 14.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Matthias Landmann: Innovator in Sputtering Technology

Introduction

Matthias Landmann is a notable inventor based in Mainaschaff, Germany. He has made significant contributions to the field of sputtering technology, particularly in the development of devices for coating substrates. His innovative approach has led to advancements that are essential in various industrial applications.

Latest Patents

Matthias Landmann holds a patent for a sputtering cathode and a device and method for coating a substrate with several layers. The invention relates to a sputtering cathode designed for coating a substrate, which includes a device for generating an external magnetic field with substantially parallel magnetic field lines in the plane of the substrate. This technology enhances the efficiency and effectiveness of the coating process.

Career Highlights

Landmann is associated with Singulus Technologies AG, a company known for its cutting-edge solutions in the field of coating technologies. His work at Singulus Technologies has allowed him to focus on innovative methods that improve substrate coating processes.

Collaborations

Matthias has collaborated with notable colleagues such as Wolfram Maass and Roland Schneider. Their combined expertise has contributed to the advancement of sputtering technology and its applications.

Conclusion

Matthias Landmann's contributions to sputtering technology and his innovative patent demonstrate his commitment to advancing industrial processes. His work continues to influence the field and showcases the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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