Matthias Krönke

Title: Innovations of Matthias Krönke in Microelectronics

Introduction

Matthias Krönke is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of microelectronics, holding a total of 6 patents. His work focuses on improving the efficiency and effectiveness of microelectronic structures and processes.

Latest Patents

One of his latest patents is a method for structuring a silicon layer. This innovative method involves applying a lacquer mask onto the silicon layer, followed by selective etching using a gas mixture of SF, HBr, and He/O. The result is openings in the silicon layer that feature especially steep sidewalls, with improved etching selectivity relative to the lacquer mask. Another notable patent is for a microelectronic structure that provides enhanced protection for hydrogen-sensitive dielectrics against contamination. This invention includes an intermediate oxide that is at least five times thicker than the hydrogen-sensitive dielectric, effectively absorbing hydrogen released during the deposition of a hydrogen barrier layer.

Career Highlights

Matthias Krönke is currently associated with Infineon Technologies AG, a leading company in the semiconductor industry. His work at Infineon has allowed him to push the boundaries of microelectronic technology, contributing to advancements that benefit various applications.

Collaborations

Throughout his career, Matthias has collaborated with notable colleagues, including Walter Hartner and Joachim Patzer. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the field.

Conclusion

Matthias Krönke's contributions to microelectronics through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in technology, ensuring better performance and reliability in microelectronic applications.