Company Filing History:
Years Active: 2022-2025
Title: Matthias Daniel: Innovator in Silicon Semiconductor Technology
Introduction
Matthias Daniel is a prominent inventor based in Freiberg, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the production of silicon wafers. With a total of 2 patents, his work has advanced the capabilities of silicon materials used in various electronic applications.
Latest Patents
Matthias Daniel's latest patents include a method for producing silicon semiconductor wafers with low concentrations of pinholes. This innovative method involves creating silicon single crystals that have an oxygen concentration greater than 2×1018 at/cm, a pinhole concentration of less than 1.0×1011 cm, and a carbon concentration of less than 5.5×1018 at/cm. Additionally, he has developed a single crystal of silicon with <100> orientation, which is doped with n-type dopant. This crystal features a unique structure that enhances its performance in electronic devices.
Career Highlights
Matthias Daniel is currently employed at Siltronic AG, a leading company in the semiconductor industry. His work at Siltronic AG has positioned him as a key player in the development of advanced silicon materials. His expertise in the Czochralski method and his focus on optimizing crystal growth processes have been instrumental in achieving high-quality silicon wafers.
Collaborations
Matthias has collaborated with notable colleagues such as Georg Raming and Ludwig Stockmeier. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.
Conclusion
Matthias Daniel's contributions to silicon semiconductor technology exemplify his dedication to innovation and excellence. His patents and work at Siltronic AG continue to influence the industry, paving the way for future advancements in semiconductor materials.