Matthew Peter Dobson

Title: Matthew Peter Dobson: Innovator in Ion Implantation Technology

Introduction

Matthew Peter Dobson is a notable inventor based in Brighton, GB. He has made significant contributions to the field of ion implantation technology, holding a total of 3 patents. His work focuses on improving the precision and efficiency of ion implanters, which are crucial in various applications, including semiconductor manufacturing.

Latest Patents

Among his latest patents is a method of implanting a substrate and an ion implanter for performing the method. This invention provides two-dimensional scanning of a substrate relative to an implant beam, allowing the beam to draw a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate, and this current value is used to control the subsequent fast scan speed, compensating for any variation in beam current on dose uniformity in the slow scan direction. Additionally, he has developed ion sources for ion implantation apparatus, where the source material for providing desired ions is presented in the form of a plate or liner that can be fitted into the reactant chamber of the ion source.

Career Highlights

Matthew currently works at Applied Materials, Inc., a leading company in the field of materials engineering solutions. His innovative approaches have significantly advanced the capabilities of ion implantation technology, making processes more efficient and reliable.

Collaborations

Throughout his career, Matthew has collaborated with esteemed colleagues, including Adrian John Murrell and Peter Michael Banks. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Matthew Peter Dobson is a distinguished inventor whose work in ion implantation technology has made a lasting impact on the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.