Matthew J Stavely

Title: Matthew J Stavely: Innovator in Semiconductor Processing

Introduction

Matthew J Stavely is a notable inventor based in Saginaw, MI (US). He has made significant contributions to the field of semiconductor processing, holding a total of 2 patents. His work focuses on minimizing contamination during the processing of semiconductor grade silicon, which is crucial for the electronics industry.

Latest Patents

Stavely's latest patents include the "Rotary Silicon Screen" and "Low-Contaminate Work Surface for Processing Semiconductor Grade Silicon." The Rotary Silicon Screen is designed to separate semiconductor grade silicon pieces into desired size ranges while minimizing contact contamination. This device features a rotatable cylindrical screen made of semiconductor grade silicon, with internal and external spacers to define its exclusion characteristics. The Low-Contaminate Work Surface provides a planar surface comprised of a parallel array of silicon elements, ensuring that the work surface maintains comparable purity to the silicon being processed, thus reducing contamination risks.

Career Highlights

Throughout his career, Stavely has worked with prominent companies such as Dow Corning Corporation and Hemlock Semiconductor Corporation. His experience in these organizations has allowed him to develop innovative solutions that address critical challenges in semiconductor manufacturing.

Collaborations

Stavely has collaborated with notable colleagues, including Richard C Dumler and Elden E Ruhlig. These partnerships have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Matthew J Stavely's contributions to semiconductor processing through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the development of cleaner and more efficient manufacturing processes for semiconductor grade silicon.