The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1992
Filed:
Jan. 25, 1991
Applicant:
Inventors:
Richard C Dumler, Breckenridge, MI (US);
Matthew J Stavely, Saginaw, MI (US);
Assignee:
Dow Corning Corporation, Midland, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23Q / ;
U.S. Cl.
CPC ...
269 15 ; 269 43 ; 269 17 ; 269 71 ; 269258 ; 2692 / ; 269286 ;
Abstract
The present invention is a low-contaminate work surface for processing semiconductor grade silicon. The work surface is comprised of a parallel array of silicon elements forming a planar surface. The silicon elements are of comparable purity with the semiconductor grade silicon to be process, thus minimizing contact contamination. In an additional embodiment of the present invention, the low-contaminate work surface is part of a work station which provides for initial screening and sizing of the semiconductor grade silicon being processed.