Matthew J Price

Title: Innovations by Matthew J Price in Semiconductor Polishing Technology

Introduction

Matthew J Price is an accomplished inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing methods. His innovative approach has led to the development of a unique patent that enhances the efficiency of semiconductor processing.

Latest Patents

Matthew J Price holds a patent for a "Method and apparatus for conditioning a semiconductor polishing pad." This invention describes a method of polishing a thin film formed on a semiconductor substrate. In this method, a polishing pad is rotated while a substrate is pressed against it, ensuring that the thin film is in direct contact with the polishing pad. During the polishing process, the pad is continually conditioned by forming a plurality of grooves into its surface. These grooves are created by a conditioning block that has a planar bottom surface with multiple groove-generating points. The grooves are generated by sweeping and rotating the conditioning block between the outer and inner radii of the polishing pad.

Career Highlights

Matthew J Price is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Matthew has collaborated with notable colleagues such as Joseph R Breivogel and Christopher E Barns. These collaborations have further enriched his work and have led to advancements in the field.

Conclusion

Matthew J Price's contributions to semiconductor polishing technology exemplify the impact of innovation in the industry. His patent reflects a significant advancement that enhances the efficiency of semiconductor processing.