Matthew J Goeckner

Title: **Matthew J. Goeckner – Innovator in Electron Beam Technology**

Introduction

Matthew J. Goeckner, located in Plano, TX, is a distinguished inventor known for his contributions to the field of electron beam technology. With a total of nine patents to his name, Goeckner has advanced various applications that utilize electron beams, particularly in chemical analysis and semiconductor processes.

Latest Patents

Among his latest innovations is the patent for an "Electron beam exciter for use in chemical analysis in processing systems." This invention introduces a gas line electron beam exciter that includes a variable density electron source, which generates a cloud of electrons in an electron chamber. A variable energy electron extractor accelerates these electrons into an effluent stream, enabling the fluorescing of species present in that stream. This patent emphasizes the variable control of both electron density and energy, providing versatility in chemical analysis applications.

Another notable patent is the "Method and apparatus for low voltage plasma doping using dual pulses." This innovative pulsed plasma doping system separates plasma ignition from ion implantation. By supplying an ignition voltage pulse to an ionizable gas alongside an implantation voltage pulse to the target, this method allows for ions to be implanted at energy levels below the Paschen curve. Such advancements showcase Goeckner's ability to push the boundaries of technology in semiconductor fabrication.

Career Highlights

Goeckner has worked with prominent firms, including Varian Semiconductor Equipment Associates, Inc. and Verity Instruments, Inc., where he honed his expertise in semiconductor equipment. His contributions have significantly impacted the industry's advancement toward more efficient and precise manufacturing techniques.

Collaborations

Throughout his career, Goeckner has collaborated with notable professionals such as Ziwei Fang and Reuel B. Liebert. These relationships exemplify his commitment to fostering teamwork and leveraging diverse expertise to achieve innovative solutions in the field of technology.

Conclusion

Matthew J. Goeckner's work stands as a testament to the power of innovation in the realm of electron beam technology. His patents not only reflect his inventive genius but also contribute to the ongoing evolution of processes in chemical analysis and semiconductor manufacturing. As Goeckner continues to refine and develop new technologies, his influential role in the industry remains firmly established.