Cambridge, MA, United States of America

Matthew J Banet


Average Co-Inventor Count = 3.4

ph-index = 9

Forward Citations = 378(Granted Patents)


Location History:

  • Cambridge, MA (US) (1998 - 2002)
  • Boston, MA (US) (2000 - 2004)

Company Filing History:


Years Active: 1998-2004

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13 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Matthew J. Banet in Semiconductor Measurements**

Introduction

Matthew J. Banet, a prominent inventor based in Cambridge, MA, has made significant strides in the field of semiconductor measurements, amassing a total of 13 patents. His innovative work primarily revolves around methods and devices that enhance the measurement precision of thin films and semiconductor substrates.

Latest Patents

Among his latest patents, the "Method and Device for Measuring Thin Films and Semiconductor Substrates Using Reflection Mode Geometry" stands out. This invention describes a sophisticated apparatus that utilizes a laser to generate optical pulses, which are then diffracted to create multiple excitation pulses. An optical system overlaps these pulses to form an excitation pattern that launches an acoustic wave, effectively modulating properties of the structure. This architecture allows for the generation of surface ripples and other time-dependent morphological changes crucial for accurate measurements of optical properties such as the refractive index.

Another notable patent is the "Method and Device for Measuring the Thickness of Thin Films Near a Sample's Edge and in a Damascene-Type Structure". This method innovatively measures structures with layers of overlying and underlying films, particularly in areas with rapidly decreasing film thickness. It outlines a systematic approach involving excitation of acoustic modes and detailed analysis to ascertain the properties of thin films in different regions of the structure, providing valuable insights for semiconductor fabrication.

Career Highlights

Matthew has applied his expertise while working at Active Impulse Systems, Inc., where his contributions have propelled advancements in measurement technologies. His ability to bridge theoretical principles with practical applications underscores his impact in the semiconductor industry.

Collaborations

Throughout his career, Matthew has collaborated with esteemed colleagues such as John A. Rogers and Martin Fuchs. These partnerships have fostered an environment of innovation and have further contributed to the development of cutting-edge measurement techniques.

Conclusion

Matthew J. Banet's inventive spirit and dedication to advancing semiconductor measurement technology position him as a key figure in the field. With a growing portfolio of patents and collaborative efforts with notable peers, he continues to influence the trajectory of innovations in thin film measurements and related applications. His work not only enhances our understanding but also supports the ongoing evolution of semiconductor technology.

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