The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2000
Filed:
Sep. 10, 1997
Matthew J Banet, Cambridge, MA (US);
John A Rogers, Castle Rock, CO (US);
Martin Fuchs, Uxbridge, MA (US);
Active Impulse Systems, Inc., , MA (US);
Abstract
A method and apparatus that determines a concentration of ions implanted in a material is described. The method includes the steps of: 1) generating at least two excitation laser sub-pulses and a probe pulse from a single pulse emitted from a laser; 2) irradiating a region of the material with a grating pattern formed by overlapping at least two excitation laser sub-pulses to initiate a time-dependent response in the region; 3) diffracting a probe laser pulse off the region to generate at least one time-dependent signal beam; 4) detecting at least one time-dependent signal beam to generate a signal waveform; and 5) processing the signal waveform to determine the concentration of ions implanted in the material.