Matthew Healy

Title: Innovations by Matthew Healy in Semiconductor Cleaning Technologies

Introduction

Matthew Healy is an accomplished inventor based in Norwalk, CT (US). He has made significant contributions to the field of semiconductor cleaning technologies. With a total of 2 patents, Healy's work focuses on advanced cleaning compositions and methods that utilize supercritical fluids.

Latest Patents

Healy's latest patents include innovative compositions and methods employing supercritical fluids, such as supercritical carbon dioxide, for the removal of unwanted materials from microelectronic device structures and process equipment. One notable composition is designed to remove flux and solder perform surface films, incorporating supercritical fluid and organic co-solvent, such as xylene. Another composition targets the removal of metals, metal oxides, and post-etch residues from semiconductor substrates, utilizing supercritical fluid and at least one β-diketone. Additionally, Healy has developed chemical formulations and methods for cleaning semiconductor wafers, which may include co-solvents, surfactants, chelating agents, and chemical reactants.

Career Highlights

Healy is currently employed at Advanced Technology Materials, Inc., where he continues to innovate in the field of semiconductor cleaning technologies. His work has been instrumental in advancing the efficiency and effectiveness of cleaning processes in microelectronics.

Collaborations

Healy collaborates with notable colleagues, including Thomas H Baum and Chongying Xu, contributing to a dynamic research environment that fosters innovation.

Conclusion

Matthew Healy's contributions to semiconductor cleaning technologies through his patents and collaborations highlight his role as a key innovator in the field. His work continues to impact the efficiency of cleaning processes in microelectronics.