The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
May. 06, 2003
Jeffrey F. Roeder, Brookfield, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Matthew Healy, Norwalk, CT (US);
Chongying Xu, New Milford, CT (US);
Jeffrey F. Roeder, Brookfield, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Matthew Healy, Norwalk, CT (US);
Chongying Xu, New Milford, CT (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
Compositions and methods employing supercritical fluids, e.g., supercritical carbon dioxide, for removal of unwanted material from microelectronic device structures and process equipment. One composition of such type, having utility for removing flux and solder perform surface films, includes supercritical fluid, e.g., supercritical CO, and organic co-solvent, e.g., xylene. Another composition of such type having utility for removal of metals, metal oxides, metal-containing post-etch residues and CMP particles from semiconductor substrates includes supercritical fluid and at least one β-diketone.