The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Nov. 25, 2002
Applicants:
Chongying Xu, New Milford, CT (US);
David W. Minsek, Pleasantville, NY (US);
Thomas H. Baum, New Fairfield, CT (US);
Matthew Healy, Norwalk, CT (US);
Inventors:
Chongying Xu, New Milford, CT (US);
David W. Minsek, Pleasantville, NY (US);
Thomas H. Baum, New Fairfield, CT (US);
Matthew Healy, Norwalk, CT (US);
Assignee:
Advanced Technology Materials, Inc., Danbury, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/30 (2006.01); C11D 3/34 (2006.01); C11D 3/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical fluid-based cleaning composition, which may further include (I) co-solvent(s), (II) surfactant(s), (III) chelating agent(s), and/or (IV) chemical reactant(s).