This inventor holds 1 USPTO granted patent. Top assignees: Mitsubishi Heavy Industries Limited, Nagoya University. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2019
Title: Matsutaka Sasahara: Innovator in Plasma Technology
Introduction
Matsutaka Sasahara, an accomplished inventor based in Tokyo, Japan, has made significant contributions in the field of plasma technology. With a focus on enhancing thrust efficiency, his work in this area is set to impact various industries, particularly those related to aerospace and propulsion systems.
Latest Patents
Matsutaka holds a patent for a "Plasma Accelerating Apparatus and Plasma Accelerating Method." This innovative apparatus features a cathode that supplies electrons to a plasma acceleration region, an anode, and a power supply that applies a voltage between the two. Notably, the design includes a supply port for propellants and a first magnetic field generator to maintain electron directionality, reducing unintended losses to the anode. This ingenious design aims to improve the overall thrust efficiency of plasma acceleration technologies.
Career Highlights
Throughout his career, Matsutaka has worked with prestigious organizations such as Mitsubishi Heavy Industries and National University Corporation Nagoya University. His experience in these institutions has allowed him to further his research and development endeavors in plasma applications.
Collaborations
Matsutaka has collaborated with talented individuals like Takuya Yamazaki and Tomoji Iwasaki. Together, they have worked on advancing the field of plasma technology, combining their expertise to foster innovation and improve practical applications.
Conclusion
Matsutaka Sasahara's contributions to the field of plasma acceleration demonstrate his commitment to innovation and engineering excellence. His patented apparatus is poised to enhance thrust efficiency, paving the way for advancements in various technological applications. As he continues to collaborate and innovate, the future looks promising for his endeavors in plasma technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile