The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2019
Filed:
Jan. 06, 2017
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
National University Corporation Nagoya University, Aichi, JP;
Takuya Yamazaki, Tokyo, JP;
Matsutaka Sasahara, Tokyo, JP;
Tomoji Iwasaki, Tokyo, JP;
Masaaki Yasui, Tokyo, JP;
Akihiro Sasoh, Aichi, JP;
Akira Iwakawa, Aichi, JP;
Daisuke Ichihara, Aichi, JP;
Keisuke Mizutani, Aichi, JP;
MITSUBISHI HEAVY INDUSTRIES, LTD., Tokyo, JP;
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, Aichi, JP;
Abstract
A plasma accelerating apparatus includes: a cathode () configured to supply electrons to a plasma acceleration region; an anode (); a power supply () configured to apply a voltage between the cathode and the anode; a supply port () arranged on an outer circumference side of the cathode to supply a propellant to the plasma acceleration region; and a first magnetic field generator () configured to generate a first axial direction magnetic field in the upstream side region of the plasma acceleration region to suppress electrons supplied from the cathode from heading for the anode. Thus, the plasma accelerating apparatus and the plasma accelerating method having high thrust efficiency is provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile