Dresden, Germany

Mathias Albert

This inventor holds 1 USPTO granted patent. Top assignee: H.c. Starck Gmbh. Active years: 2006.


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Mathias Albert

Introduction

Mathias Albert is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of materials science, particularly in the production of shaped articles from niobium and tantalum. His innovative approach has led to advancements in electrochemical etching processes.

Latest Patents

Mathias Albert holds a patent for a "Process for the production of shaped articles of niobium or tantalum by electrochemical etching." This process involves etching a niobium or tantalum sheet that is covered by a structured photoresist mask in an aqueous solution containing hydrofluoric acid. The etching occurs under electrochemical conditions where strong noise is superposed on the etching current, and the etching solution includes a water-soluble polymer. This patent showcases his expertise in developing advanced manufacturing techniques.

Career Highlights

Albert is associated with H.C. Starck GmbH, a company known for its high-performance materials. His work at the company has allowed him to explore innovative solutions in the field of electrochemistry and materials engineering. His contributions have been instrumental in enhancing the capabilities of niobium and tantalum applications.

Collaborations

Throughout his career, Mathias Albert has collaborated with talented individuals such as Marianne Gottschling and Josua Löffelholz. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Mathias Albert's work exemplifies the spirit of innovation in materials science. His patent and contributions to H.C. Starck GmbH highlight his role as a key figure in advancing electrochemical etching processes. His dedication to research and development continues to inspire future innovations in the field.

Profile summary based on public USPTO records.
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