The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Dec. 19, 2003
Applicants:
Marianne Gottschling, Goslar, DE;
Josua Löffelholz, Langelsheim, DE;
Mathias Albert, Dresden, DE;
Günter Sadowski, Radebeul, DE;
Inventors:
Marianne Gottschling, Goslar, DE;
Josua Löffelholz, Langelsheim, DE;
Mathias Albert, Dresden, DE;
Günter Sadowski, Radebeul, DE;
Assignee:
H. C. Starck GmbH, Goslar, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25F 3/008 (2006.01);
U.S. Cl.
CPC ...
Abstract
Process for the production of shaped articles of niobium or tantalum by electrochemical etching of a niobium or tantalum sheet covered by a structured photoresist mask in an aqueous solution containing hydrofluoric acid, the etching being effected under electrochemical conditions under which strong noise is superposed on the etching current and the etching solution contains a water-soluble polymer.