Company Filing History:
Years Active: 2023-2025
Title: Mason Payne: Innovator in Ion Implantation Technology
Introduction
Mason Payne is a notable inventor based in Vista, California, recognized for his contributions to ion implantation technology. With a total of 2 patents, he has made significant advancements in the field, particularly in the design and functionality of ion implanters.
Latest Patents
Mason Payne's latest patents include a "Repeller assembly for mounting into an arc chamber of an ion implanter and arc chamber containing the repeller assembly." This innovative repeller assembly is designed to mount within the arc chamber of an ion implanter, featuring a knob-shaped body positioned opposite the cathode assembly. The assembly includes a repeller shaft that extends through the arc chamber wall, along with a tubular insert and insulators that ensure proper functionality. Another patent, "Cathode holding assembly and arc chamber support assembly with the cathode holding assembly," details a cathode holding assembly that integrates a cathode holding plate, an insulator block, and a shield cap, enhancing the precision and efficiency of ion implantation processes.
Career Highlights
Throughout his career, Mason has worked with several companies, including Plansee USA LLC and E/G Electro-Graph, Inc. His experience in these organizations has contributed to his expertise in ion implantation technology and innovation.
Collaborations
Mason has collaborated with notable coworkers such as Nam Ngo and Gerhard Duerrhammer, further enriching his professional journey and expanding his impact in the field.
Conclusion
Mason Payne's innovative work in ion implantation technology, highlighted by his patents and collaborations, showcases his significant contributions to the industry. His advancements continue to influence the development of more efficient ion implanters.