Kyoto, Japan

Masayuki Wada

This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Dainippon Screen Mfg. Co., Ltd., Imec Vzw. Active years: 2008-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Wada. Retrieved from https://idiyas.com/inventor/masayuki-wada-6etcwwqx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2008-2012

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3 patents (USPTO):Explore Patents

Title: Innovator Masayuki Wada: Advancements in Semiconductor Technology

Introduction

Masayuki Wada, an inventive mind based in Kyoto, Japan, has made significant contributions to the field of semiconductor technology. Holding three patents, Wada's innovations reflect a dedication to improving processes within the semiconductor industry. His work continues to influence the way semiconductor devices are manufactured and treated.

Latest Patents

Masayuki Wada's latest patents underscore his expertise in substrate treatment and resist removal methods. One of his patents describes a substrate treating method that includes preparing a semiconductor substrate with an oxide film containing at least one rare earth oxide or alkaline earth oxide. This method involves exposing a portion of the oxide film and performing a rinse step using an alkaline chemical or an organic solvent, thereby optimizing the substrate preparation process for enhanced semiconductor device manufacturing.

Another notable patent relates to a resist removing method and apparatus. This inventive technique employs a combination of sulfuric acid and hydrogen peroxide water to effectively remove resist from a substrate's surface. Following the removal process, additional hydrogen peroxide water is used to eliminate any remaining sulfuric acid, showcasing Wada's innovative approach to simplifying and improving substrate treatment processes.

Career Highlights

Throughout his career, Masayuki Wada has worked for esteemed companies in the semiconductor field. Notably, he has been associated with Dainippon Screen Manufacturing Co., Ltd., where he contributed to advancements in production technology. His experience at Imec further highlights his involvement in cutting-edge research and development in semiconductors.

Collaborations

Wada's innovative journey has included collaborations with prominent professionals in the field. He has worked alongside skilled colleagues such as Rita Vos and Paul Mertens, enhancing the synergy of his projects and contributing to the collective advancement of semiconductor technologies.

Conclusion

Masayuki Wada's contributions to semiconductor technology are marked by his innovative patents and collaborations with leading professionals in the field. His work not only enhances manufacturing techniques but also exemplifies the spirit of innovation within the semiconductor industry. As an inventor, Wada continues to pave the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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