The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2012

Filed:

Jun. 11, 2010
Applicants:

Rita Vos, Tremelo, BE;

Paul Mertens, Bonheiden, BE;

Tom Schram, Rixensart, BE;

Masayuki Wada, Kyoto, JP;

Inventors:

Rita Vos, Tremelo, BE;

Paul Mertens, Bonheiden, BE;

Tom Schram, Rixensart, BE;

Masayuki Wada, Kyoto, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate treating method comprising a step of preparing a semiconductor substrate (W,) which has an oxide film () containing at least one of a rare earth oxide and an alkaline earth oxide, at least a portion of the oxide film () being exposed, and a rinse step of supplying the oxide film () on the semiconductor substrate (W,) with a rinse liquid made of an alkaline chemical or an organic solvent. Preferably, the alkaline chemical is an alkaline aqueous solution having a pH of more than 7. Further, preferably, the organic solvent is a high concentration organic solvent having a concentration of substantially 100%.


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