This inventor holds 1 USPTO granted patent. Top assignee: Nissin Electric Co., Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Masayuki Tsuji: Innovator in Plasma Processing Technology
Introduction
Masayuki Tsuji is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that enhances substrate treatment processes.
Latest Patents
Tsuji holds a patent for a plasma processing apparatus. This inductively-coupled-plasma (ICP) type apparatus features an antenna that is substantially straight in a plan view. The apparatus generates plasma for performing treatments on substrates when a high-frequency current is applied to the antenna, creating an electric field within a vacuum container. The design includes two go-and-return conductors that are closely positioned in an up-down direction, which is perpendicular to the substrate's surface. The high-frequency current flows in opposite directions between these conductors, with the interval between them varying along the antenna's length. This innovative design allows for improved plasma treatment efficiency.
Career Highlights
Masayuki Tsuji has had a distinguished career at Nissin Electric Co., Ltd. His work has been pivotal in advancing plasma processing technologies. Tsuji's expertise and innovative spirit have positioned him as a key figure in his field.
Collaborations
Throughout his career, Tsuji has collaborated with esteemed colleagues, including Yasunori Ando and Yoshio Matsubara. These collaborations have further enriched his contributions to plasma processing technology.
Conclusion
Masayuki Tsuji's innovative work in plasma processing technology exemplifies the impact of dedicated inventors in advancing industrial applications. His patent for the plasma processing apparatus showcases his commitment to enhancing substrate treatment processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile