The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Apr. 17, 2012
Takanori Tsunoda, Kyoto, JP;
Yoshio Matsubara, Kyoto, JP;
Yasunori Ando, Kyoto, JP;
Masayuki Tsuji, Kyoto, JP;
Takanori Tsunoda, Kyoto, JP;
Yoshio Matsubara, Kyoto, JP;
Yasunori Ando, Kyoto, JP;
Masayuki Tsuji, Kyoto, JP;
Nissin Electric Co., Ltd., Kyoto, JP;
Abstract
An inductively-coupled-plasma (ICP) type plasma processing apparatus is provided. The plasma processing includes an antenna which is substantially straight in a plan view of the antenna. A plasma is generated for performing a plasma treatment to a substrate when a high frequency current is applied to the antenna to form an electric field in a vacuum container. The antenna includes two go-and-return conductors closely disposed to each other in an up-down direction, wherein the up-down direction is perpendicular to a surface of the substrate, and the high frequency current is applied to flow in opposite directions between the two go-and-return conductors. An interval is defined by a distance between the two go-and-return conductors in the up-down direction, varies in a longitudinal direction of the antenna.