Miyagi, Japan

Masayuki Sawataishi


Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Nirasaki, JP (2007)
  • Kofu, JP (2012)
  • Hwaseong, KR (2017)
  • Miyagi, JP (2016 - 2023)

Company Filing History:


Years Active: 2007-2024

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8 patents (USPTO):Explore Patents

Title: Masayuki Sawataishi: Innovator in Etching Technology

Introduction

Masayuki Sawataishi is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of etching technology, holding a total of 8 patents. His work focuses on advanced methods and apparatuses that enhance the precision and efficiency of substrate processing.

Latest Patents

Among his latest patents, Sawataishi has developed an etching method and plasma processing apparatus. This innovative etching method involves disposing a substrate with a silicon oxide film in a chamber, where a plurality of etching stop layers are arranged at different positions within the film. The process includes supplying a processing gas that contains tungsten, molybdenum, carbon, fluoride, and an oxygen-containing gas, followed by generating plasma to etch the silicon oxide film. This results in the formation of recesses that reach the etching stop layers. Another notable patent is a method of etching a substrate with a multilayered film, which includes a silicon-containing insulating layer and an undercoat layer. The etching process utilizes a process gas containing a fluorocarbon gas and a noble gas, allowing for precise etching of the multilayered film.

Career Highlights

Masayuki Sawataishi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His expertise in etching technology has positioned him as a key figure in the development of innovative solutions for substrate processing.

Collaborations

Throughout his career, Sawataishi has collaborated with notable coworkers, including Tomonori Miwa and Masato Kushibiki. These collaborations have further enhanced the impact of his inventions in the field.

Conclusion

Masayuki Sawataishi's contributions to etching technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable asset to the industry.

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