Kasaoka, Japan

Masayuki Satoh

This inventor holds 1 USPTO granted patent. Top assignee: Semiconductor Technology Academic Research Center. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Satoh. Retrieved from https://idiyas.com/inventor/masayuki-satoh-1wim485c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Masayuki Satoh: Innovator in Semiconductor Technology

Introduction: Masayuki Satoh, an esteemed inventor hailing from Kasaoka, Japan, has made significant contributions to the field of semiconductor technology. With his innovative approach, he has developed a method that enhances the manufacturing processes involved in creating electronic devices.

Latest Patents: Satoh holds a patent titled "Method for Selectively Forming Electric Conductor and Method for Manufacturing Semiconductor Device." This groundbreaking method involves the selective formation of an electric conductor by utilizing supercritical fluid technology. It includes a detailed process of using a metal compound to create electric conductors within specific recesses of a processing target, thereby ensuring precision in semiconductor manufacturing.

Career Highlights: Currently, Masayuki Satoh works at the Semiconductor Technology Academic Research Center. His expertise in semiconductor technology has made him a crucial player in advancing manufacturing techniques in the industry.

Collaborations: Throughout his career, Masayuki has collaborated with distinguished colleagues such as Eiichi Kondoh and Michiru Hirose. These partnerships have further enriched the research landscape and fostered innovative developments in the semiconductor sector.

Conclusion: Masayuki Satoh's contributions to the field of semiconductor technology showcase his dedication to innovation and excellence. His patent, which offers a novel method for forming electric conductors, underscores his role as an important figure in the advancement of semiconductor manufacturing processes. With ongoing collaborations and a commitment to research, Satoh continues to influence the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…