The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Mar. 20, 2007
Eiichi Kondoh, Kofu, JP;
Michiru Hirose, Kasugai, JP;
Hitoshi Tanaka, Kawasaki, JP;
Masayuki Satoh, Kasaoka, JP;
Hisashi Yano, Jyoyo, JP;
Masaki Yoshimaru, Hachioji, JP;
Eiichi Kondoh, Kofu, JP;
Michiru Hirose, Kasugai, JP;
Hitoshi Tanaka, Kawasaki, JP;
Masayuki Satoh, Kasaoka, JP;
Hisashi Yano, Jyoyo, JP;
Masaki Yoshimaru, Hachioji, JP;
Semiconductor Technology Academic Research Center, Yokohama-shi, JP;
Abstract
A method for selectively forming an electric conductor, the method including disposing a processing target and a metal compound in an atmosphere including a supercritical fluid, the processing target having formed thereon at least one recess for providing an electric conductor, the metal compound including a metal serving as a main component of the electric conductor, and dissolving at least part of the metal compound in the supercritical fluid, selectively introducing the metal compound dissolved in the supercritical fluid into the recess in contact with a surface of the processing target, and coagulating in the recess the metal compound introduced into the recess to precipitate the metal from the metal compound, and coagulating the metal precipitated in the recess, thereby providing the electric conductor in the recess.