Yokohama, Japan

Masayoshi Serizawa

This inventor holds 2 USPTO granted patents. Top assignees: Hitachi, Ltd., Renesas Technology Corp.. Active years: 2004-2008.


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Fujisawa, JP (2004)
  • Yokohama, JP (2008)

Company Filing History:


Years Active: 2004-2008

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Masayoshi Serizawa: Innovator in Semiconductor Processing

Introduction

Masayoshi Serizawa is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of his latest patents is a circuit board production method and its apparatus. This invention enables the detection of particles floating inside a processing chamber using an optical system that includes one observing window and one unit. The objective of this invention is to execute the detection of these particles effectively. The method involves irradiating a beam into the processing chamber through the observing window. The beam is P-polarized and intensity-modulated at a frequency that differs from the exciting source's frequency and its integer multiples. The observing window is inclined to form a Brewster angle with respect to the P-polarized incident beam. Backward scattered lights from the particles are then received and image-photographed through the same observing window. The frequency and wavelength components of the intensity-modulated beam are detected from the received signals, allowing for the judgment of the number, size, and distribution of the particles.

Another significant patent is a method of processing a semiconductor device. This method includes several steps, such as generating plasma in a processing chamber to form or process a thin film on a semiconductor device. It also involves scanning an intensity-modulated laser beam through a window in the processing chamber. The back scattered light from fine particles suspended in the chamber is received by a sensor, which detects the desired frequency component from the output signal. This information provides insights into the quantity, size, and distribution of the fine particles illuminated by the laser beam.

Career Highlights

Masayoshi Serizawa has worked with prominent companies in the technology sector, including Renesas Technology Corporation and Hitachi, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Serizawa has collaborated with notable individuals such as Hiroyuki Nakano and Toshihiko Nakata. These collaborations have likely enriched his work and led to advancements in his field.

Conclusion

Masayoshi Serizawa's contributions to semiconductor processing through his innovative patents highlight his role as a significant inventor in the industry. His work continues to influence advancements in technology and processing

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…