Amagasaki, Japan

Masayo Kuriyama

This inventor holds 2 USPTO granted patents. Top assignee: Mec Company Ltd.. Active years: 2002-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayo Kuriyama. Retrieved from https://idiyas.com/inventor/masayo-kuriyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2002-2007

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2 patents (USPTO):Explore Patents

Title: Masayo Kuriyama: Innovator in Etching Solutions

Introduction

Masayo Kuriyama is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of etching solutions, particularly for metals and copper alloys. With a total of 2 patents, his work has advanced the methods used in the production of wiring boards.

Latest Patents

Kuriyama's latest patents include innovative etching solutions and methods. One of his patents describes an etchant that consists of an aqueous solution containing hydrochloric acid, nitric acid, and a cupric ion source. This etching method allows for effective contact with metals such as nickel, chromium, nickel-chromium alloys, and palladium. Another patent focuses on an etchant for copper or copper alloys, which includes specific components like alkanolamine and aliphatic carboxylic acid. This etchant is designed to provide a high etching rate while minimizing corrosion and unpleasant odors.

Career Highlights

Masayo Kuriyama is associated with Mec Company Ltd., where he continues to develop and refine his etching solutions. His work has been instrumental in improving the efficiency and effectiveness of etching processes in various applications.

Collaborations

Kuriyama has collaborated with notable coworkers, including Daisaku Akiyama and Kaoru Urushibata. These collaborations have contributed to the advancement of his innovative solutions in the field of etching.

Conclusion

Masayo Kuriyama's contributions to etching technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of chemical processes and their applications in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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