Tokyo, Japan

Masayasu Fujioka

This inventor holds 1 USPTO granted patent and 5 published patent applications and 1 EPO patent. Top assignee: Jsr Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayasu Fujioka. Retrieved from https://idiyas.com/inventor/masayasu-fujioka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Masayasu Fujioka - Innovator in Protective Plate Technology

Introduction

Masayasu Fujioka is an inventor based in Osaka-shi, Japan. He is known for his innovative work in the field of protective plates and display devices. His recent patent application focuses on enhancing the durability and functionality of display technologies.

Latest Patent Applications

Masayasu Fujioka has submitted a patent application titled "PROTECTIVE PLATE AND DISPLAY DEVICE." This invention aims to provide a protective plate and a display device that can suppress yellowing, reduce costs, and prevent glass from scattering. The protective plate includes a glass substrate, a first layer laminated on one side of the glass substrate, a second layer laminated on the first layer, and an antireflective film pasted on the opposite side of the glass substrate. The first layer contains polyorganosiloxane (A) and metal oxide particles (B), while the second layer contains polyorganosiloxane (C). The antireflective film is made of organic matter, and the transmittance of the laminated body of the glass substrate, the first layer, and the second layer is 82% or less at a wavelength of 340 nm.

Conclusion

Masayasu Fujioka's contributions to protective plate technology highlight his innovative approach to improving display devices. His work aims to enhance the performance and longevity of these technologies, showcasing his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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