This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Panasonic Corporation. Active years: 2010-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Osaka, JP (2010)
- Yamanashi, JP (2011)
Company Filing History:
Years Active: 2010-2011
Title: Masaya Watanabe: Innovator in Substrate Cleaning Technology
Introduction
Masaya Watanabe is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate cleaning technology, holding a total of 2 patents. His work focuses on developing innovative solutions that enhance the efficiency and effectiveness of cleaning processes in various applications.
Latest Patents
Watanabe's latest patents include a substrate cleaning apparatus and a method employed therein. This apparatus is designed for cleaning both the front-side and back-side surfaces of a substrate by utilizing a cleaning tape. The system features a presser member that applies pressure to the cleaning tape against the clean target surfaces, along with a moving device that facilitates relative movement between the cleaning tape and the substrate.
Another notable patent is for a board terminal cleaning apparatus. This device cleans terminal portions by bringing a cleaning member into contact with the terminal. It includes a support member that holds the cleaning member in two positions, a cleaning head that pressurizes the cleaning member, and a moving unit that adjusts the position of the support members and the cleaning head at different velocities.
Career Highlights
Masaya Watanabe is currently employed at Panasonic Corporation, where he continues to innovate and develop advanced cleaning technologies. His work has been instrumental in improving the performance and reliability of cleaning processes in various industries.
Collaborations
Watanabe collaborates with talented individuals such as Shinjiro Tsuji and Keiji Fujiwara. Their combined expertise contributes to the advancement of cleaning technologies and the successful development of innovative solutions.
Conclusion
Masaya Watanabe is a dedicated inventor whose work in substrate cleaning technology has led to significant advancements in the field. His patents reflect his commitment to innovation and his ability to address complex challenges in cleaning processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile