Company Filing History:
Years Active: 2025
Title: Masaya Iwabuchi: Innovator in Sputtering Technology
Introduction
Masaya Iwabuchi is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. His innovative work has led to advancements in various applications, including electronics and coatings.
Latest Patents
Iwabuchi holds a patent for a sputtering target and method for producing a sputtering target. This invention involves a sputtering target comprised of a plurality of members, including a target material and a base material. The first member contains aluminum (Al), while the second member contains copper (Cu). Notably, at least one of these members includes magnesium (Mg). The sputtering target features an alloy layer containing Al and Cu, which is in contact with both members. This alloy layer also includes an Mg-containing layer with 5.0 at % or more of Mg in at least a part of the alloy layer. This innovative design enhances the performance and efficiency of sputtering processes.
Career Highlights
Masaya Iwabuchi is currently employed at JX Advanced Metals Corporation, where he continues to work on innovative materials and technologies. His expertise in sputtering technology has positioned him as a key figure in the industry.
Collaborations
Iwabuchi collaborates with talented colleagues, including Shuhei Murata and Yusuke Sato. Their combined efforts contribute to the advancement of materials science and technology.
Conclusion
Masaya Iwabuchi's contributions to sputtering technology exemplify the importance of innovation in materials science. His patent and ongoing work at JX Advanced Metals Corporation highlight his role as a leading inventor in this field.