Location History:
- Chicago, IL (US) (1979)
- Southfield, MI (US) (1984 - 1985)
- Birmingham, MI (US) (1979 - 1987)
- Bloomfield Hills, MI (US) (1995 - 2000)
Company Filing History:
Years Active: 1979-2000
Areas of Expertise:
Title: Masatsugu Izu: Innovator in Plasma Enhanced Chemical Vapor Deposition
Introduction
Masatsugu Izu is a prominent inventor located in Birmingham, MI, USA, recognized for his pioneering work in the field of Plasma Enhanced Chemical Vapor Deposition (PECVD) technology. Holding an impressive portfolio of 43 patents, Izu has made significant contributions to advancements in gas jet PECVD methods, showcasing innovative approaches to thin-film deposition.
Latest Patents
Izu's most recent patents include groundbreaking inventions such as the E-beam/microwave gas jet PECVD method and apparatus for depositing. This innovative process combines microwave and e-beam energy to create a plasma of excited species, enabling high-speed, high-quality surface modification or thin-film deposition on various substrates. The introduction of a gas jet system facilitates a remarkable increase in deposition speed while ensuring optimal quality in the materials deposited.
Another notable patent is the method for depositing modified silicon oxide barrier coatings through microwave plasma enhanced chemical vapor deposition. This invention provides a barrier to gaseous oxygen and water vapor, making it particularly valuable for coatings on temperature-sensitive substrates. By employing a precursor gaseous mixture that includes silicon-hydrogen, oxygen, and modifiers like germanium, Izu’s method eliminates the undesirable silicon-hydrogen bonds, further enhancing the functionality of the barrier coatings.
Career Highlights
Throughout his career, Masatsugu Izu has contributed his expertise to several notable companies, including Energy Conversion Devices, Inc., and Sovonics Solar Systems. His work in these organizations has enabled the development of critical technologies in the renewable energy sector and advanced materials science.
Collaborations
Izu has collaborated with esteemed professionals in the field, including Vincent D Cannella and Stanford R Ovshinsky. These partnerships have further enriched his innovative endeavors and facilitated the development of advanced technologies that have transformed industry standards.
Conclusion
Masatsugu Izu's extensive list of patents and his impactful contributions to PECVD technology underscore his significance as an inventor and innovator. His latest inventions not only enhance the efficiency of thin-film deposition processes but also provide solutions for the broader challenges in materials science and energy conversion. Through his work, Izu continues to shape the future of technology in significant and meaningful ways.