Kanagawa, Japan

Masato Shimoyama

This inventor holds 1 USPTO granted patent. Top assignee: Mitsumi Electric Company Ltd.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Shimoyama. Retrieved from https://idiyas.com/inventor/masato-shimoyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Masato Shimoyama: Innovator in Fine Conductive Pattern Technology

Introduction

Masato Shimoyama is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of conductive pattern technology. His innovative methods have paved the way for advancements in various electronic applications.

Latest Patents

Masato Shimoyama holds a patent for a "Method of preparing fine conductive pattern." The objective of this invention is to provide a method for forming a fine conductive pattern that is both easy and accurate to produce. The process involves forming an insulating layer on a substrate, followed by the application of a pattern resist. The insulating layer is then etched in two steps to create groove portions, allowing for the formation of overhang portions at the lower edges of the pattern resist. Finally, conductive film portions are deposited, leading to the preparation of a fine conductor pattern.

Career Highlights

Shimoyama is associated with Mitsumi Electric Company Ltd., where he has been instrumental in developing innovative technologies. His work has contributed to the company's reputation as a leader in electronic components and systems.

Collaborations

He has collaborated with notable colleagues such as Shigemitsu Watanabe and Masaki Kasahara, further enhancing the innovative environment at Mitsumi Electric Company Ltd.

Conclusion

Masato Shimoyama's contributions to the field of conductive pattern technology exemplify the spirit of innovation. His patent and collaborative efforts continue to influence advancements in electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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