Masato Nishizawa

Title: Masato Nishizawa: Pioneer in Semiconductor Innovations

Introduction

Masato Nishizawa, an accomplished inventor based in Nagano, Japan, has made significant contributions to the field of semiconductor technology. With a total of five patents to his name, Nishizawa has demonstrated a commitment to pushing the boundaries of innovation.

Latest Patents

One of his most recent patents includes a novel method for semiconductor device manufacturing. This process involves depositing a polysilicon film within a trench formed in a silicon element substrate. The technics used allow for anisotropic etching, preserving the film on the trench's side wall. This unique approach enables the oxidation of the polysilicon film, resulting in an insulating film that fills the trench, while simultaneously forming an oxidized layer on the silicon substrate to create a trench-mold separation area.

Another noteworthy invention is the field emission type electron emitting device, along with its production method. This device features a comb-like or wedge-like structure where either the emitter or both the emitter and anode electrode are crafted from a single-crystal silicon thin film of an SOI (Silicon On Insulator) wafer. The meticulous design allows for the emitter to have sharp edges achieving high performance due to its (111) face formation through anisotropic etching.

Career Highlights

Throughout his career, Masato Nishizawa has been associated with prominent companies including Fuji Electric Co., Ltd. His work at these organizations has not only contributed to his personal achievements but also to the advancement of semiconductor technologies on a larger scale.

Collaborations

Working alongside talented individuals has been a key aspect of Nishizawa's career. Notably, he collaborated with professionals such as Shinichi Hashimoto and Junji Itoh, whose collective expertise has helped drive innovative projects forward.

Conclusion

Masato Nishizawa stands out as a distinguished inventor whose advancements in semiconductor manufacturing techniques have paved the way for future innovations. With a dedication to research and collaboration, he continues to influence the technology landscape, ensuring that his contributions are felt for years to come.