Location History:
- Teri, JP (1999)
- Vancouver, WA (US) (1998 - 2000)
Company Filing History:
6 out of 25,543 
3 out of 68 
3 out of 2,034 
Years Active: 1998-2000
Title: Innovations of Masato Kobayashi in Semiconductor Technology
Introduction
Masato Kobayashi is a notable inventor based in Vancouver, WA, who has made significant contributions to the field of semiconductor technology. With a total of six patents to his name, his work primarily focuses on methods for applying chemical vapor deposition (CVD) copper to integrated circuit substrates.
Latest Patents
Kobayashi's latest patents include a precursor with (methoxy) (methyl) silylolefin ligand to deposit copper. This innovative method enhances the bond between the ligand and the (hfac)Cu complex, ensuring consistent temperatures during copper deposition. Additionally, he has developed a method for removing CVD copper from semiconductor wafers using diluted nitric acid and an edge bead removal tool. This technique allows for the protection of sensitive areas on the wafer while effectively clearing copper from the perimeter.
Career Highlights
Throughout his career, Masato Kobayashi has worked with prominent companies such as Sharp Kabushiki Kaisha Corporation and Sharp Microelectronics Technology, Inc. His expertise in semiconductor technology has positioned him as a valuable asset in the industry.
Collaborations
Kobayashi has collaborated with notable colleagues, including Tue H Nguyen and Lawrence J Charneski, further enhancing his contributions to the field.
Conclusion
Masato Kobayashi's innovative work in semiconductor technology, particularly in the deposition and removal of copper, showcases his expertise and commitment to advancing the industry. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing.