Masato Kaneda

This inventor holds 7 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Showa Denko K.k.. Active years: 1992-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Kaneda. Retrieved from https://idiyas.com/inventor/masato-kaneda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 (Patent Applications = 1)

% Patents Active = 71.4

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 27(Granted Patents)

Location History:

Oita, JP (1992 - 2007)
Shunan, JP (2009 - 2013)

Company Filing History:

7 out of 1,961

Showa Denko K.k.

patents

Years Active: 1992-2013

Loading Chart...

7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8431333 - Method for removing an uncured photosensitive composition (2013-04-30),

2. 8153357 - Photosensitive composition remover (2012-04-10),

3. 7510815 - Removing solution for photosensitive composition (2009-03-31),

4. 7230145 - Catalyst for producing both end-hydroxyl group-terminated diols, process for producing the catalyst, process for producing the diols by using the catalyst, and both end-hydroxyl group-terminated diols obtained by the process (2007-06-12),

5. 6410809 - Cyclohexanedimethanol compound and process of producing productive intermediates therefor (2002-06-25),

6. 6069222 - Polyester and polyurethane derived from specific alicyclic diols (2000-05-30),

7. 5164425 - Artificial marble composition (1992-11-17),

Title: Masato Kaneda: Innovator in Photosensitive Composition Removers

Introduction

Masato Kaneda is a notable inventor based in Shunan, Japan. He has made significant contributions to the field of photosensitive compositions, holding a total of 7 patents. His work focuses on developing effective methods for removing uncured photosensitive compositions, which are crucial in various manufacturing processes.

Latest Patents

One of Kaneda's latest patents is a method for removing an uncured photosensitive composition. This innovative remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon with 9 carbon atoms or more within the molecule. The remover also contains an aprotic polar solvent and/or another solvent other than aprotic polar solvents. It is particularly effective for removing uncured photosensitive composition films deposited at the periphery, edges, or back of a substrate, as well as those deposited on the surface of system members or equipment during the formation of a photosensitive composition film on glass substrates or semiconductor wafers.

Career Highlights

Masato Kaneda is currently employed at Showa Denko K.K., where he continues to innovate in the field of photosensitive compositions. His expertise and dedication have led to advancements that benefit various industries, particularly in semiconductor manufacturing.

Collaborations

Throughout his career, Kaneda has collaborated with esteemed colleagues such as Hiroshi Uchida and Yasuhiro Mikawa. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Masato Kaneda's contributions to the field of photosensitive composition removers highlight his role as an influential inventor. His innovative methods and collaborations continue to shape the industry, making significant strides in manufacturing processes.

Profile summary based on public USPTO records.