Showa Denko K.k.

Masato Kaneda

Hiroshi Uchida

Yasuhiro Mikawa

Koji Shimizu

Kouichi Terao

Yasushi Kadowaki

Mikito Kitayama

Yoshihiro Honda

A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further includes an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like.

Method for removing an uncured photosensitive composition

A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover comprises 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further comprises an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like. It is preferably used for removal of a photosensitive composition containing a pigment.

Photosensitive composition remover

A removing solution for photosensitive composition for removal of colored pigment-containing photosensitive compositions, comprising at least one solvent selected from the group consisting of alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters and alicyclic ketones, at least one solvent selected from the group consisting of linear amides, cyclic amides, sulfur-containing compounds and cyclic esters, and if desired an aromatic hydrocarbon having 9 or more carbon atoms. The removing solution for photosensitive composition exhibits excellent photosensitive composition removing performance.

Removing solution for photosensitive composition

A process for producing a both end-hydroxyl group-terminated diol, wherein an epoxy alcohol represented by the general formula (1) is subjected to a hydrogenolysis reaction in the presence of a catalyst for producing both end-hydroxyl group terminated diols, which catalyst contains at least one element selected from the group consisting of Group V elements, Group VI elements, Group VII elements, Group VIII elements, Group IX elements, Group X elements, and Group XI elements in the periodic table, in the presence of at least one solvent selected from the group consisting of ethers, esters, aromatic hydrocarbon compounds, alicyclic hydrocarbon compounds and aliphatic hydrocarbon compounds, to thereby obtain a both end-hydroxyl group-terminated diol represented by general formula (2). General formula (1) and (2) are as described in the specification.

Catalyst for producing both end-hydroxyl group-terminated diols, process for producing the catalyst, process for producing the diols by using the catalyst, and both end-hydroxyl group-terminated diols obtained by the process

A process of producing a 1,1-cyclohexanedimethanol compound having a substituent group at the 2-position in which the step of producing a 1-hydroxymethyl-3-cyclohexene-1-carbaldehyde compound by Diels-Alder reaction of a &bgr;-substituted-&agr;,&bgr;-unsaturated aldehyde and a chain conjugated diene compound using an anhydrous tin (IV) halide catalyst is essential and a process of producing productive intermediates therefor. 1,1-Cyclohexanedimethanol compounds having a substituent group at least at the 2-position thereof obtained by the present invention are useful as a raw material for polyesters, unsaturated polyesters, alkyds, polyurethanes, epoxy resins, acrylic resins, etc. and as raw materials for functional organic compounds.

Cyclohexanedimethanol compound and process of producing productive intermediates therefor

A polyester or polyurethane polymer having a repeating unit represented by the following formula (1): ##STR1## wherein A is a polyol compound residue represented by the following formula (2) or formula (3): ##STR2## wherein R.sup.1 and R.sup.3 each individually represents an alkyl group having from 1 to 4 carbon atoms, and R.sup.2 and R.sup.4 each individually represents a hydrogen atom or a methyl group; and B is represented by the following formula (4) or formula (5): ##STR3## wherein X represents an alkylene, cycloalkylene, arylene or arylalkylene group having from 1 to 12 carbon atoms; ##STR4## wherein Y represents an alkylene, cycloalkylene, arylene or arylalkylene group having from 1 to 12 carbon atoms.

Polyester and polyurethane derived from specific alicyclic diols

A composition for artificial marble comprising (a) 10 to 60% by weight of an allyl-terminated oligomer, (b) 40 to 86% by weight of an inorganic filler and (c) 0 to 30% by weight of a reactive monomer. The composition provides artificial marble having a deep appearance characteristic of marble and having a high strength and high abrasion resistance.

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Shunan, Japan

Masato Kaneda