Company Filing History:
Years Active: 2016-2018
Title: Masato Ishimaru: Innovator in Plasma Processing Technologies
Introduction
Masato Ishimaru is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing, holding a total of 6 patents. His innovative work focuses on methods that enhance the efficiency and effectiveness of plasma etching and cleaning processes.
Latest Patents
Ishimaru's latest patents include a plasma processing method and a plasma etching method. The plasma processing method involves forming a pattern of a mask on a laminated film of a magnetic film and a metal oxide film. This method includes steps such as plasma etching the magnetic film in a chamber and performing plasma cleaning using a gas mixture of chlorine element-containing gas and boron trichloride gas. The plasma etching method details a process for etching a sample that consists of multiple layers, including magnetic films and metal films. This method utilizes carbon monoxide gas and a mixed gas of hydrogen and inactive gas for effective etching.
Career Highlights
Masato Ishimaru is currently employed at Hitachi High-Technologies Corporation, where he continues to develop advanced plasma processing technologies. His work has been instrumental in improving manufacturing processes in various high-tech industries.
Collaborations
Ishimaru has collaborated with notable colleagues such as Makoto Suyama and Naohiro Yamamoto. Their combined expertise has contributed to the advancement of plasma processing techniques.
Conclusion
Masato Ishimaru's innovative contributions to plasma processing technologies have established him as a key figure in the field. His patents reflect a commitment to enhancing manufacturing processes through advanced techniques.
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