Ibaraki, Japan

Masato Ebihara

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignees: Tokyo Seimitsu Co., Ltd., Tosei Engineering Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Ebihara. Retrieved from https://idiyas.com/inventor/masato-ebihara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Masato Ebihara: Innovator in Dimension Measurement Technology

Introduction

Masato Ebihara is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of dimension measurement technology. His innovative approach has led to the development of a unique device that enhances operability and efficiency in measuring dimensions.

Latest Patents

Ebihara holds a patent for a dimension measuring device. This device is designed to improve operability when using expensive display devices, such as bar graphs. It features multiple dimension measuring sections and a display section that shows dimension measurements generated by these sections. Notably, the display section can show fewer measurements simultaneously than the number generated. Additionally, the device includes a display control section that automatically selects which dimension measurement to display based on the generated data.

Career Highlights

Throughout his career, Masato Ebihara has worked with prominent companies, including Tokyo Seimitsu Co., Ltd. and Tosei Engineering Corporation. His experience in these organizations has contributed to his expertise in the field of measurement technology.

Collaborations

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Conclusion

Masato Ebihara's innovative work in dimension measurement technology showcases his commitment to enhancing operability and efficiency in this field. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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