Company Filing History:

12 out of 21,351

Mitsubishi Denki Kabushiki Kaisha

patents

2 out of 2,899

Seiko Instruments Inc

patents

3 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1991-2004

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6715944 - Apparatus for removing photoresist film (2004-04-06),

2. 6517999 - Method of removing photoresist film (2003-02-11),

3. 6255127 - Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same (2001-07-03),

4. 6124142 - Method for analyzing minute foreign substance elements (2000-09-26),

5. 5877035 - Analyzing method and apparatus for minute foreign substances, and (1999-03-02),

6. 5590672 - Semiconductor cleaning apparatus and wafer cassette (1997-01-07),

7. 5568821 - Semiconductor cleaning apparatus and wafer cassette (1996-10-29),

8. 5551459 - Semiconductor cleaning apparatus and wafer cassette (1996-09-03),

9. 5517027 - Method for detecting and examining slightly irregular surface states, (1996-05-14),

10. 5470392 - Semiconductor device processing method (1995-11-28),

11. 5445171 - Semiconductor cleaning apparatus and wafer cassette (1995-08-29),

12. 5432601 - Fine particle analyzing device (1995-07-11),

13. 5383482 - Semiconductor processing apparatus and module (1995-01-24),

14. 5379785 - Cleaning apparatus (1995-01-10),

15. 5187118 - Method of manufacturing semiconductor devices (1993-02-16),

Title: Masashi Ohmori: Innovator in Photoresist Film Removal Technology

Introduction

Masashi Ohmori is a prominent inventor based in Itami, Japan. He has made significant contributions to the field of photoresist film removal technology, holding a total of 16 patents. His innovative approaches have enhanced the efficiency and environmental friendliness of this critical process in semiconductor manufacturing.

Latest Patents

Ohmori's latest patents include an "Apparatus for Removing Photoresist Film" and a "Method of Removing Photoresist Film." The apparatus features a substrate cassette for fixing a substrate covered with a photoresist film, an ozone feed tube for supplying ozone, and a liquid feed tube for delivering a photoresist film removing solution. This design allows for continuous supply of ozone and the removing solution, optimizing the removal process. The method emphasizes high efficiency and environmental friendliness while minimizing material consumption and costs associated with ventilation facilities. It involves a sealed system where the substrate surface contacts the removing solution, with ozone present in the vicinity to aid in the decomposition of the photoresist film.

Career Highlights

Throughout his career, Masashi Ohmori has worked with notable companies, including Mitsubishi Electric Corporation. His work has been instrumental in advancing technologies related to photoresist film removal, making significant impacts in the semiconductor industry.

Collaborations

Ohmori has collaborated with esteemed colleagues such as Naohiko Fujino and Satoru Kotoh. These partnerships have fostered innovation and development in his field.

Conclusion

Masashi Ohmori's contributions to photoresist film removal technology exemplify his commitment to innovation and environmental sustainability. His patents and career achievements reflect a dedication to advancing semiconductor manufacturing processes.

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