Location History:
- Chiba, JP (2006 - 2009)
- Tokyo, JP (2017)
Company Filing History:
3 out of 223 
1 out of 223 
Years Active: 2006-2017
Title: Masashi Muramatsu: Innovator in Charged Particle Beam Technology
Introduction
Masashi Muramatsu is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of charged particle beam technology, holding a total of 4 patents. His innovative work has advanced the capabilities of charged particle beam apparatuses and processing methods.
Latest Patents
Muramatsu's latest patents include a "Charged Particle Beam Apparatus and Processing Method." This invention features a charged particle beam column designed to irradiate a charged particle beam. The controller of the apparatus is capable of controlling the beam to operate at different pixel intervals for various regions. This technology allows for the generation of secondary electrons, which are crucial for forming high-quality images. Another notable patent is the "Charged Particle Beam Irradiation Method and Charged Particle Beam Apparatus." This invention involves a computer that sets a process area based on an observed mask image, determining the positions of representative points with sub-pixel accuracy. This method enhances the precision of charged particle beam applications.
Career Highlights
Throughout his career, Masashi Muramatsu has worked with notable companies such as Sii Nanotechnology Inc. and Hitachi High-Tech Science Corporation. His experience in these organizations has contributed to his expertise in charged particle beam technology and its applications.
Collaborations
Muramatsu has collaborated with talented individuals in his field, including Tomokazu Kozakai and Ryoji Hagiwara. These collaborations have likely fostered innovation and the exchange of ideas, further enhancing his contributions to technology.
Conclusion
Masashi Muramatsu's work in charged particle beam technology exemplifies the spirit of innovation. His patents and career achievements reflect his dedication to advancing this critical field. His contributions continue to influence the development of advanced imaging and processing techniques.