Tokyo, Japan

Masashi Ataka

This inventor holds 1 USPTO granted patent. Top assignee: Holon Co., Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masashi Ataka. Retrieved from https://idiyas.com/inventor/masashi-ataka-3hvssgg0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Masashi Ataka: Innovator in Pattern Specification Technology

Introduction

Masashi Ataka is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of pattern specification technology. His work has led to advancements that enhance the precision and efficiency of pattern matching processes.

Latest Patents

Masashi Ataka holds a patent for a "Pattern specification method and pattern specification apparatus." This invention involves a method for specifying a drawn microscopic pattern. The process includes creating a first pattern that reflects process shift information based on design data. It also involves enlarging the drawn pattern and performing pattern matching between the first pattern and the enlarged pattern. The final step outputs the enlarged pattern that matches most closely in the pattern matching process. He has 1 patent to his name.

Career Highlights

Ataka has made significant strides in his career, particularly through his work at Holon Co., Ltd. His expertise in pattern specification has positioned him as a key figure in the industry. His innovative approach has garnered attention and respect among his peers.

Collaborations

Masashi Ataka collaborates with various professionals in his field, including his coworker Hitomi Sato. Their combined efforts contribute to the advancement of technology in pattern specification.

Conclusion

Masashi Ataka's contributions to pattern specification technology highlight his role as an influential inventor. His innovative methods and dedication to his work continue to shape the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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