This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Kokusai Electric Corporation. Active years: 2025-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025-2026
Title: Masaru Kadoshima: Innovator in Semiconductor Processing
Introduction
Masaru Kadoshima is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in substrate processing.
Latest Patents
Kadoshima holds a patent for a "Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus." This technique involves several steps: supplying a first gas to the substrate to form a modified layer, removing the modified layer with a second gas, and using an inert gas to remove a portion of the film through a sequential process. He has 1 patent to his name.
Career Highlights
Kadoshima is currently employed at Kokusai Electric Corporation, where he continues to develop innovative solutions in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.
Collaborations
Kadoshima collaborates with various professionals in his field, including his coworker Atsushi Sano. Their combined expertise contributes to the advancement of semiconductor technologies.
Conclusion
Masaru Kadoshima's contributions to semiconductor processing highlight his role as an influential inventor in the industry. His innovative methods and dedication to research continue to impact the field positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile