The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Sep. 30, 2022
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Masaru Kadoshima, Toyama, JP;

Atsushi Sano, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G05D 21/00 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); G05D 21/00 (2013.01); H01J 37/32834 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/32135 (2013.01);
Abstract

There is provided a technique that includes: a) supplying a first gas to the substrate on which a film is formed and forming a modified layer on a surface of the film; b) after a), supplying a second gas to the modified layer and removing the modified layer; c) after b), supplying an inert gas having a first temperature higher than a processing temperature of b) to the film; and d) removing a portion of the film by performing a), b), and c) sequentially a predetermined number of times.


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